Physical Sciences Inc. Publications Abstract: Atomic Fluorine Source for Chemical Lasers

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Abstract: Atomic Fluorine Source for Chemical Lasers

S.J. Davis, D.B. Oakes, M.J. Read, A.H. Gelb, "Atomic Fluorine Source for Chemical Lasers," SPIE 4631-29, presented at SPIE (San Jose, CA) , SPIE Proceedings: Gas and Chemical Lasers and Intense Beam Applications III 4631 (2002).

This paper was published in SPIE Proceedings, Gas and Chemical Lasers and Intense Beam Applications III, Vol. 4631 (2002) and is made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Abstract

We present results from the early development of an F atom source appropriate for HF and AGIL chemical laser research. The system uses high power microwaves to produce a high enthalpy plasma that thermally dissociates molecular species such as SF6 and F2. Results of the characterization of the flow are presented.

Keywords

hydrogen fluoride lasers, combustors, halogen atom sources, microwave discharges,

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